SKU:15222129808
LaAlO3, (111) 10x10x0.5 mm substrate, 2 sides Epi polished - LAOc101005S2
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USA
- USA
- CAN
- USA
- CAN
Ships within 48 hours · Estimated delivery Jul 23 - Jul 28
Description
LaAlO3, (111) 10x10x0.5 mm substrate, 2 sides Epi polished - LAOc101005S2Substrate Specifcations: Wafer Size: 10 x 10 x 0. 5 mm thickness + 0. 05 mm, Wafer Orientation: (111) + 0. 5 Deg Polishing: Two sides CMP polished with free sub surface damaged. Surface finish (RMS or Ra) : < 10A Package: Under 1000 class clean room, and in 100 grade plastic bag in a wafer container. Lattice Constant a=3. 792Pseudo cubic Warning: LaAlO3 crystal has a visible twin on a polished surface, which is normal nature .
The thickness of the silicon oxide layer is 500 nm
and is distinguished by its short radiation length ( 0
Conductive type: Si P- type
and 3mm) are included for immediate use
0M LiPF6 in EC:DEC:EMC=2:3:1 with 1
EPD: < 5000 /cmE2
1280 oC Density
Optional Crimping Die Core for 3-Electrode 2032 coin cells are available at extra cost
please click the picture for more detail
1700X & 1800X
This is a pair of high temperature silicone rubber O rings for OD 2
Mold Release Rod
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